Open AccessA Study on the Realization of the High Efficiency LCD Photoresist Removal Technology
Author(s) -
Young-Su Son,
Sang-Yong Ham,
B.J. Kim,
Sung-Hwee Lee
Publication year - 2007
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2007.20.11.977
Subject(s) - photoresist , ozone , materials science , liquid crystal display , realization (probability) , volumetric flow rate , process (computing) , layer (electronics) , immersion (mathematics) , composite material , process engineering , optoelectronics , chemistry , engineering , computer science , mechanics , organic chemistry , operating system , statistics , mathematics , physics , pure mathematics
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