Open AccessEtching Characteristics of GST Thin Films using Inductively Coupled Plasma of Cl2-Ar Gas Mixtures
Author(s) -
NamKi Min,
ManSu Kim,
Shutov Dmitriy,
Sung-Ihl Kim,
KwangHo Kwon
Publication year - 2007
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2007.20.10.846
Subject(s) - x ray photoelectron spectroscopy , analytical chemistry (journal) , materials science , inductively coupled plasma , etching (microfabrication) , thin film , photoresist , halide , reactive ion etching , plasma , nanotechnology , chemistry , chemical engineering , inorganic chemistry , layer (electronics) , chromatography , physics , quantum mechanics , engineering
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