Open AccessElectrical Characteristic of AI/AIN/GaAs MIS capacitor Fabricated by Reactive Sputtering Method for the (NH4)2S Treatment
Author(s) -
Soon-Nam Chu,
Jung-Youl Kwon,
Jung-Cheul Park,
Heon-Yong Lee
Publication year - 2007
Publication title -
jeon'gi jeonja jaeryo haghoe nonmunji/jeon-gi jeonja jaeryo hakoe nonmunji
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2007.20.1.008
Subject(s) - sputtering , capacitor , materials science , optoelectronics , composite material , electrical engineering , analytical chemistry (journal) , thin film , voltage , nanotechnology , chemistry , engineering , chromatography