Open AccessInductively Coupled Plasma Chemical Vapor Deposition System for Thin Film Ppassivation of Top Emitting Organic Light Emitting Diodes
Author(s) -
HanKi Kim
Publication year - 2006
Publication title -
jeon'gi jeonja jaeryo haghoe nonmunji/jeon-gi jeonja jaeryo hakoe nonmunji
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2006.19.6.538
Subject(s) - passivation , materials science , plasma enhanced chemical vapor deposition , inductively coupled plasma , chemical vapor deposition , thin film , layer (electronics) , substrate (aquarium) , optoelectronics , plasma , light emitting diode , diode , remote plasma , plasma processing , analytical chemistry (journal) , nanotechnology , chemistry , oceanography , physics , quantum mechanics , chromatography , geology