Open AccessOptimization of Capacitor Threshold VTImplantation for Planar P-MOS DRAM Cell
Author(s) -
Chang Sung-keun,
Kim Youn-Jang
Publication year - 2006
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2006.19.2.126
Subject(s) - dram , capacitor , planar , materials science , optoelectronics , electrical engineering , electronic engineering , computer science , engineering , voltage , computer graphics (images)
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