
Optimization of Capacitor Threshold VTImplantation for Planar P-MOS DRAM Cell
Publication year - 2006
Publication title -
jeon'gi jeonja jaeryo haghoe nonmunji/jeon-gi jeonja jaeryo hakoe nonmunji
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2006.19.2.126
Subject(s) - dram , capacitor , planar , materials science , optoelectronics , electrical engineering , electronic engineering , computer science , engineering , voltage , computer graphics (images)