Open AccessAnalysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface
Author(s) -
Sun-Hee Cho,
Won-Jong Lee
Publication year - 2006
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2006.19.12.1078
Subject(s) - x ray photoelectron spectroscopy , impurity , etching (microfabrication) , analytical chemistry (journal) , oxygen , contamination , secondary ion mass spectrometry , thermal oxidation , reactive ion etching , materials science , plasma etching , mass spectrometry , surface layer , silicon , chemistry , layer (electronics) , nanotechnology , chemical engineering , metallurgy , chromatography , ecology , organic chemistry , engineering , biology
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