Open AccessModeling of Plasma Etch Process using a Radial Basis Function Network
Author(s) -
K H Park,
Byungwhan Kim
Publication year - 2005
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2005.18.1.001
Subject(s) - materials science , process (computing) , radial basis function , basis (linear algebra) , function (biology) , plasma , composite material , process engineering , computer science , mathematics , engineering , artificial neural network , artificial intelligence , physics , geometry , quantum mechanics , biology , evolutionary biology , operating system
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