Open AccessStudies for Improvement in SiO2Film Property for Thin Film Transistor
Author(s) -
C.K. Seo,
Myung-suk Shim,
Junsin Yi
Publication year - 2004
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2004.17.6.580
Subject(s) - passivation , materials science , thin film transistor , dielectric , gate dielectric , annealing (glass) , thin film , optoelectronics , forming gas , transistor , chemical vapor deposition , semiconductor , layer (electronics) , nanotechnology , composite material , electrical engineering , engineering , voltage
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