Open AccessRole of Oxidants for Metal CMP Applications
Publication year - 2004
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2004.17.4.378
Subject(s) - tungsten , chemical mechanical planarization , materials science , passivation , layer (electronics) , polishing , tin , metal , metallurgy , surface roughness , selectivity , slurry , surface finish , tungsten carbide , chemical engineering , composite material , chemistry , organic chemistry , catalysis , engineering
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