Open AccessDeposition and Electrical Properties of Silicon Nitride Thin Film MIM Capacitors for MMIC Applications
Publication year - 2004
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2004.17.3.283
Subject(s) - capacitor , materials science , silicon nitride , monolithic microwave integrated circuit , optoelectronics , deposition (geology) , thin film , silicon , nitride , engineering physics , composite material , electronic engineering , electrical engineering , nanotechnology , voltage , engineering , layer (electronics) , amplifier , paleontology , cmos , sediment , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom