Open AccessEffects of Cobalt Ohmic Layer on Contact Resistance
Publication year - 2003
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2003.16.5.390
Subject(s) - ohmic contact , materials science , contact resistance , tin , transmission electron microscopy , composite material , layer (electronics) , microstructure , metallurgy , optoelectronics , nanotechnology
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