Open AccessSurface Reactions on the Bi4-xLaxTiO3O12Thin Films Etched in Inductively Coupled CF4/Ar Plasma
Publication year - 2003
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2003.16.5.378
Subject(s) - x ray photoelectron spectroscopy , etching (microfabrication) , analytical chemistry (journal) , inductively coupled plasma , sputtering , materials science , thin film , reactive ion etching , metal , spectroscopy , chemical state , plasma , chemistry , nanotechnology , layer (electronics) , nuclear magnetic resonance , metallurgy , physics , chromatography , quantum mechanics
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