Open AccessThe Dependency of Surface Damage to NiSi for CMOS Technology
Publication year - 2003
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2003.16.4.280
Subject(s) - materials science , silicide , silicon , sheet resistance , tin , etching (microfabrication) , substrate (aquarium) , layer (electronics) , composite material , optoelectronics , cmos , metallurgy , oceanography , geology
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