Open AccessEffect of Annealing on Carbon Nitride Films Prepared by High Voltage Discharge Plasma
Publication year - 2002
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2002.15.5.455
Subject(s) - x ray photoelectron spectroscopy , annealing (glass) , auger electron spectroscopy , materials science , analytical chemistry (journal) , carbon nitride , nitrogen , nitride , chemical engineering , composite material , chemistry , organic chemistry , physics , layer (electronics) , photocatalysis , engineering , catalysis , nuclear physics
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