Open AccessA Study on Etch Characteristics of CeO2Thin Film in An Ar/CF4/Cl2Plasma
Publication year - 2002
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2002.15.5.388
Subject(s) - x ray photoelectron spectroscopy , analytical chemistry (journal) , etching (microfabrication) , thin film , materials science , inductively coupled plasma , argon , selectivity , ion , plasma , chemistry , catalysis , layer (electronics) , nanotechnology , chemical engineering , biochemistry , physics , organic chemistry , chromatography , quantum mechanics , engineering
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