Open AccessThe Effect of Thermal Annealing and Growth of Cdln2S4Single Crystal Thin Film by Hot Wall Epitaxy
Publication year - 2002
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2002.15.11.923
Subject(s) - van der pauw method , thin film , materials science , single crystal , photoluminescence , band gap , annealing (glass) , crystal (programming language) , epitaxy , substrate (aquarium) , analytical chemistry (journal) , crystallography , hall effect , optoelectronics , electrical resistivity and conductivity , chemistry , composite material , nanotechnology , layer (electronics) , programming language , oceanography , engineering , chromatography , geology , computer science , electrical engineering
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