Open AccessNeural Network Models of Oxide Film Etch Process for Via Contact Formation
Publication year - 2002
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2002.15.1.007
Subject(s) - materials science , artificial neural network , oxide , etching (microfabrication) , voltage , volumetric flow rate , process (computing) , reactive ion etching , ion , analytical chemistry (journal) , optoelectronics , electronic engineering , composite material , electrical engineering , computer science , engineering , mechanics , chemistry , metallurgy , physics , artificial intelligence , chromatography , organic chemistry , layer (electronics) , operating system
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