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In situ Stress Measurements with Submonolayer Sensitivity As a Probe of Coherent-to-incoherent Matching at an Interface in Ultrathin Magnetic Films
Author(s) -
JongRyul Jeong,
Young-Seok Kim,
SungChul Shin
Publication year - 2002
Publication title -
journal of magnetics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 15
eISSN - 2233-6656
pISSN - 1226-1750
DOI - 10.4283/jmag.2002.7.4.151
Subject(s) - materials science , detector , cantilever , stress (linguistics) , substrate (aquarium) , sputter deposition , sensitivity (control systems) , optoelectronics , in situ , displacement (psychology) , bending , optics , relaxation (psychology) , thin film , sputtering , nanotechnology , composite material , chemistry , physics , psychology , social psychology , linguistics , philosophy , oceanography , engineering , organic chemistry , electronic engineering , psychotherapist , geology

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