Open AccessDiffusion and Thermal Stability Characteristics of W-B-C-N Thin Film
Author(s) -
Sang-Yoon Kim,
Soo-In Kim,
ChangWoo Lee
Publication year - 2006
Publication title -
journal of the korean magnetics society
Language(s) - English
Resource type - Journals
eISSN - 2233-6648
pISSN - 1598-5385
DOI - 10.4283/jkms.2006.16.1.075
Subject(s) - materials science , diffusion barrier , thin film , silicon , annealing (glass) , semiconductor , tungsten , sputter deposition , thermal stability , boron , diffusion , analytical chemistry (journal) , substrate (aquarium) , sputtering , chemical engineering , nanotechnology , composite material , metallurgy , optoelectronics , layer (electronics) , chemistry , physics , oceanography , organic chemistry , chromatography , geology , engineering , thermodynamics
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