Open AccessDiffusion Barrier Properties of W-C-N Thin Film between La0.67Sr0.33MnO3and Si
Author(s) -
Ji Seop So,
S. Y. Kim,
Ku Kang,
Moon Kyoo Song,
C. W. Lee
Publication year - 2005
Publication title -
han-guk jagi hakoeji/han'gug ja'gi haghoeji
Language(s) - English
Resource type - Journals
eISSN - 2233-6648
pISSN - 1598-5385
DOI - 10.4283/jkms.2005.15.2.130
Subject(s) - materials science , coercivity , analytical chemistry (journal) , annealing (glass) , tungsten , nitrogen , thin film , impurity , diffusion , sputter deposition , sputtering , diffusion barrier , partial pressure , nitride , magnetization , condensed matter physics , composite material , oxygen , nanotechnology , metallurgy , chemistry , layer (electronics) , magnetic field , organic chemistry , physics , chromatography , thermodynamics , quantum mechanics