Open AccessTransfer of Machined Patterns on an Aluminum Plate to Pyrex Glass Using Reactive Ion Etching SF<sub>6</sub> Plasma without Masks
Author(s) -
Carlos M. Ortiz-Lima,
Fernando J. Quiñones-Novelo,
Alberto Jaramillo-Núñez,
J. CastroRamos
Publication year - 2014
Publication title -
journal of surface engineered materials and advanced technology
Language(s) - English
Resource type - Journals
eISSN - 2161-489X
pISSN - 2161-4881
DOI - 10.4236/jsemat.2014.45030
Subject(s) - etching (microfabrication) , reactive ion etching , materials science , substrate (aquarium) , aluminium , surface roughness , analytical chemistry (journal) , surface finish , composite material , ion , dry etching , chemistry , chromatography , oceanography , organic chemistry , layer (electronics) , geology