Plasma Enhanced-Chemical Vapour Deposition of Scuff-Resistant Hydrogenated Amorphous Carbon Coatings on C100 Steel | Zendy

Nicoletta De Vietro | Zendy; Gianluigi Intonti | Zendy; Francesco Fracassi | Zendy; Gianluca Quarta | Zendy; L. Maruccio | Zendy; Lucio Calcagnile | Zendy

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Plasma Enhanced-Chemical Vapour Deposition of Scuff-Resistant Hydrogenated Amorphous Carbon Coatings on C100 Steel

Author(s) -

Nicoletta De Vietro,

Gianluigi Intonti,

Francesco Fracassi,

Gianluca Quarta,

L. Maruccio,

Lucio Calcagnile

Publication year - 2014

Publication title -

journal of surface engineered materials and advanced technology

Language(s) - English

Resource type - Journals

eISSN - 2161-489X

pISSN - 2161-4881

DOI - 10.4236/jsemat.2014.43017

Subject(s) - materials science , nanoindentation , amorphous carbon , amorphous solid , x ray photoelectron spectroscopy , raman spectroscopy , carbon fibers , chemical vapor deposition , sputter deposition , metallurgy , carbon film , sputtering , carbon steel , deposition (geology) , composite material , chemical engineering , thin film , nanotechnology , corrosion , crystallography , composite number , chemistry , physics , optics , engineering , paleontology , sediment , biology

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