Open AccessEffect of Chamber Conditions and Substrate Type on PECVD of SiGeSn Films
Author(s) -
V. K. Hariharan,
Jignesh Vanjaria,
Arul Chakkaravarthi Arjunan,
Gary S. Tompa,
Hongbin Yu
Publication year - 2021
Publication title -
crystal structure theory and applications
Language(s) - English
Resource type - Journals
eISSN - 2169-2505
pISSN - 2169-2491
DOI - 10.4236/csta.2021.103004
Subject(s) - torr , crystallinity , plasma enhanced chemical vapor deposition , substrate (aquarium) , materials science , crystallite , epitaxy , optoelectronics , chemical vapor deposition , band gap , analytical chemistry (journal) , chemistry , nanotechnology , composite material , metallurgy , physics , oceanography , geology , layer (electronics) , chromatography , thermodynamics
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