Open AccessPlasma-Assisted Chemical Vapor Deposition of TiO<sub>2</sub> Thin Films for Highly Hydrophilic Performance
Author(s) -
Satoshi Yamauchi,
Yoh Imai
Publication year - 2013
Publication title -
crystal structure theory and applications
Language(s) - English
Resource type - Journals
eISSN - 2169-2505
pISSN - 2169-2491
DOI - 10.4236/csta.2013.21001
Subject(s) - chemical vapor deposition , layer (electronics) , materials science , anatase , analytical chemistry (journal) , scanning electron microscope , amorphous solid , raman spectroscopy , substrate (aquarium) , plasma enhanced chemical vapor deposition , contact angle , transmission electron microscopy , thin film , chemistry , nanotechnology , composite material , optics , chromatography , crystallography , organic chemistry , physics , oceanography , photocatalysis , geology , catalysis
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom