Open AccessCharacteristics of a Silicon Wafer <111> and <004> after Planting Nitrogen
Author(s) -
Mehdi Simiari,
Ramin Roozehdar Mogaddam
Publication year - 2017
Publication title -
advances in materials physics and chemistry
Language(s) - English
Resource type - Journals
eISSN - 2162-5328
pISSN - 2162-531X
DOI - 10.4236/ampc.2017.75014
Subject(s) - materials science , wafer , nitrogen , silicon , annealing (glass) , ion , surface roughness , ion implantation , silicon nitride , surface finish , sowing , analytical chemistry (journal) , chemistry , nanotechnology , composite material , metallurgy , organic chemistry , chromatography , botany , biology