Open AccessQuartz Crystal Microbalances for Evaluating Gas Motion Differences between Dichlorosilane and Trichlorosilane in Ambient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor
Author(s) -
Mana Otani,
Toshinori Takahashi,
Hitoshi Habuka,
Yuuki Ishida,
S. Ikeda,
Shiro Hara
Publication year - 2020
Publication title -
advances in chemical engineering and science
Language(s) - English
Resource type - Journals
eISSN - 2160-0392
pISSN - 2160-0406
DOI - 10.4236/aces.2020.103014
Subject(s) - trichlorosilane , dichlorosilane , quartz , chemical vapor deposition , crystal (programming language) , hydrogen , deposition (geology) , analytical chemistry (journal) , chemistry , materials science , chemical engineering , nanotechnology , optoelectronics , metallurgy , organic chemistry , engineering , geology , silicon , paleontology , sediment , computer science , programming language
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