Open AccessConstruction of Membrane Sieves Using Stoichiometric and Stress‐Reduced Si 3 N 4 /SiO 2 /Si 3 N 4 Multilayer Films and Their Applications in Blood Plasma Separation
Author(s) -
Lee DaeSik,
Choi Yo Han,
Han Yong Duk,
Yoon Hyun C.,
Shoji Shuichi,
Jung Mun Youn
Publication year - 2012
Publication title -
etri journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.295
H-Index - 46
eISSN - 2233-7326
pISSN - 1225-6463
DOI - 10.4218/etrij.12.1711.0013
Subject(s) - membrane , materials science , stoichiometry , wafer , molecular sieve , silicon , chemical vapor deposition , chemical engineering , plasma enhanced chemical vapor deposition , analytical chemistry (journal) , agarose , nanotechnology , optoelectronics , chromatography , chemistry , catalysis , organic chemistry , biochemistry , engineering
The novelty of this study resides in the fabrication of stoichiometric and stress‐reduced Si 3 N 4 /SiO 2 /Si 3 N 4 triple‐layer membrane sieves. The membrane sieves were designed to be very flat and thin, mechanically stress‐reduced, and stable in their electrical and chemical properties. All insulating materials are deposited stoichiometrically by a low‐pressure chemical vapor deposition system. The membranes with a thickness of 0.4 µm have pores with a diameter of about 1 µm. The device is fabricated on a 6” silicon wafer with the semiconductor processes. We utilized the membrane sieves for plasma separations from human whole blood. To enhance the separation ability of blood plasma, an agarose gel matrix was attached to the membrane sieves. We could separate about 1 µL of blood plasma from 5 µL of human whole blood. Our device can be used in the cell‐based biosensors or analysis systems in analytical chemistry.