Open AccessPressure Control Organic Vapor Deposition Methods for Fabricating Organic Thin‐Film Transistors
Author(s) -
Ahn SeongDeok,
Kang Seong Youl,
Oh Ji Young,
Suh Kyung Soo,
Cho Kyoung Ik,
Koo Jae Bon
Publication year - 2012
Publication title -
etri journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.295
H-Index - 46
eISSN - 2233-7326
pISSN - 1225-6463
DOI - 10.4218/etrij.12.0212.0266
Subject(s) - thin film transistor , pentacene , materials science , deposition (geology) , substrate (aquarium) , optoelectronics , thin film , transistor , chemical vapor deposition , current (fluid) , nanotechnology , electronic engineering , electrical engineering , engineering , layer (electronics) , voltage , paleontology , oceanography , sediment , geology , biology
In this letter, we report on the development progress of a pressure control organic vapor deposition (PCOVD) technology used to design and build a large area deposition system. We also investigate the growth characteristics of a pentacene thin film by PCOVD. Using the PCOVD method, the mobility and on/off current ratio of an organic thin‐film transistor (OTFT) on a plastic substrate are 0.1 cm 2 /Vs and 10 6 , respectively. The developed OTFT can be applied to a flexible display on a plastic substrate.