Open AccessNanogap Array Fabrication Using Doubly Clamped Freestanding Silicon Nanowires and Angle Evaporations
Author(s) -
Yu Han Young,
Ah Chil Seong,
Baek InBok,
Kim Ansoon,
Yang JongHeon,
Ahn ChangGuen,
Park Chan Woo,
Kim Byung Hoon
Publication year - 2009
Publication title -
etri journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.295
H-Index - 46
eISSN - 2233-7326
pISSN - 1225-6463
DOI - 10.4218/etrij.09.0109.0006
Subject(s) - materials science , nanowire , fabrication , silicon , evaporation , nanotechnology , silicon nanowires , semiconductor , optoelectronics , electronics , transistor , electrical engineering , medicine , alternative medicine , physics , engineering , pathology , voltage , thermodynamics
We present a simple semiconductor process to fabricate nanogap arrays for application in molecular electronics and nano‐bio electronics using a combination of freestanding silicon nanowires and angle evaporation. The gap distance is modulated using the height of the silicon dioxide, the width of the Si nanowires, and the evaporation angle. In addition, we fabricate and apply the nanogap arrays in single‐electron transistors using DNA‐linked Au nanoparticles for the detection of DNA hybridization.