Open AccessNovel Patterning of Gold Using Spin‐Coatable Gold Electron‐Beam Resist
Author(s) -
Kim KiChul,
Lee ImBok,
Kang DaeJoon,
Maeng Sunglyul
Publication year - 2007
Publication title -
etri journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.295
H-Index - 46
eISSN - 2233-7326
pISSN - 1225-6463
DOI - 10.4218/etrij.07.0207.0183
Subject(s) - resist , electron beam lithography , materials science , nanotechnology , lithography , deposition (geology) , etching (microfabrication) , colloidal gold , cathode ray , nanostructure , electron , optoelectronics , nanoparticle , layer (electronics) , physics , paleontology , quantum mechanics , sediment , biology
Conventional lithography methods of gold patterning are based on deposition and lift‐off or deposition and etching. In this letter, we demonstrate a novel method of gold patterning using spin‐coatable gold electron‐beam resist which is functionalized gold nanocrystals with amine ligands. Amine‐stabilized gold electron beam resist exhibits good sensitivity, 3.0 mC/cm 2 , compared to that of thiol‐stabilized gold electron beam resists. The proposed method reduces the number of processing steps and provides greater freedom in the patterning of complex nanostructures.