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Reaktor - optimering vir die vervaardiging van homogene grootoppervlak amorfe silikon-sonselle
Author(s) -
J. D. Saunderson
Publication year - 1998
Publication title -
suid-afrikaanse tydskrif vir natuurwetenskap en tegnologie/die suid-afrikaanse tydskrif vir natuurwetenskap en tegnologie
Language(s) - English
Resource type - Journals
eISSN - 2222-4173
pISSN - 0254-3486
DOI - 10.4102/satnt.v17i2.690
Subject(s) - homogeneity (statistics) , amorphous solid , hydrogen , materials science , amorphous silicon , silicon , composite material , analytical chemistry (journal) , metallurgy , chemistry , crystallography , computer science , environmental chemistry , crystalline silicon , organic chemistry , machine learning
Results are presented on the optimisation of the configuration of a large area pilot plant for the production of thin films of hydrogen­ated amorphous silicon (a-Si:H). The basic design of the reactor is discussed, and the correlation between the configuration inside the reactor and the resulting homogeneity of the material is demonstrated. It is indicated that the homogeneity is mainly determined by the shape of the antenna, the distance between the antenna and the substrate, the direction and position of the gas inlet and the dilution of the reactive gasses with hydrogen. A homogeneity factor of 2,5% was obtained across a substrate area of 320 mm x 300 mm

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