Open AccessThe influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties
Author(s) -
Velaphi Msomi,
O. Nemraoui
Publication year - 2010
Publication title -
south african journal of science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.317
H-Index - 61
eISSN - 1996-7489
pISSN - 0038-2353
DOI - 10.4102/sajs.v106i11/12.297
Subject(s) - microstructure , vanadium dioxide , materials science , thin film , vanadium , deposition (geology) , sputter deposition , texture (cosmology) , thermochromism , soda lime , mineralogy , chemical engineering , sputtering , metallurgy , composite material , nanotechnology , chemistry , geology , sediment , engineering , organic chemistry , paleontology , image (mathematics) , artificial intelligence , computer science
Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 °C to 550 °C, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011) plane, indicating the presence of vanadium dioxide