Open AccessCatalysts based on Fenton reaction for SiC wafer in chemical magnetorheological finishing
Author(s) -
Huazhuo Liang,
Jiabin Lu,
Qiusheng Yan
Publication year - 2018
Publication title -
aims materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.367
H-Index - 16
eISSN - 2372-0484
pISSN - 2372-0468
DOI - 10.3934/matersci.2018.6.1112
Subject(s) - catalysis , radical , surface roughness , materials science , wafer , silicon carbide , polishing , hydroxyl value , magnetorheological fluid , chemical reaction , chemical engineering , hydroxyl radical , oxide , surface finish , corrosion , inorganic chemistry , chemistry , metallurgy , composite material , organic chemistry , nanotechnology , polyol , damper , structural engineering , polyurethane , engineering