z-logo
open-access-imgOpen Access
Deposition and Characterization of Nickel Selenide Thin Films for Applications in Optoelectronic Devices
Author(s) -
P. A. Nwofe,
R. A. Chikwen,
P. E. Agbo,
H. U. Igwe
Publication year - 2016
Publication title -
asian journal of scientific research
Language(s) - English
Resource type - Journals
eISSN - 2077-2076
pISSN - 1992-1454
DOI - 10.3923/ajsr.2017.43.49
Subject(s) - materials science , characterization (materials science) , nickel , deposition (geology) , optoelectronics , thin film , nanotechnology , selenide , metallurgy , selenium , paleontology , sediment , biology

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom