Open AccessKey Points of Motion Control for Stage of Lithography
Author(s) -
Wei Teng
Publication year - 2014
Publication title -
jixie gongcheng xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.342
H-Index - 50
ISSN - 0577-6686
DOI - 10.3901/jme.2014.08.165
Subject(s) - key (lock) , lithography , motion (physics) , motion control , computer science , stage (stratigraphy) , artificial intelligence , physics , optics , geology , computer security , robot , paleontology