Open AccessResearch and Implementation on Critical Technology of Chemical Mechanical Polishing Tool for 300 mm Wafer
Author(s) -
Tongqing Wang
Publication year - 2014
Publication title -
jixie gongcheng xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.342
H-Index - 50
ISSN - 0577-6686
DOI - 10.3901/jme.2014.05.182
Subject(s) - polishing , wafer , chemical mechanical planarization , materials science , mechanical engineering , engineering drawing , metallurgy , engineering , optoelectronics