Open AccessFactors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System
Author(s) -
Hu Yan,
Qiuyan Fang,
Jian-Zhang Zhou,
Dongping Zhan,
Kang Shi,
Zhiling Tian,
Tian Zhao-Wu
Publication year - 2013
Publication title -
wuli huaxue xuebao
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.396
H-Index - 37
ISSN - 1000-6818
DOI - 10.3866/pku.whxb201309043
Subject(s) - hydroxyl radical , etching (microfabrication) , photochemistry , chemistry , materials science , radical , nanotechnology , organic chemistry , layer (electronics)