Open AccessEffect of OH Radicals on Formaldehyde Removal in Dielectric Barrier Discharge
Author(s) -
Heng Shi,
Wenchun Wang,
Dezheng Yang,
Yan Huo,
Jia Li
Publication year - 2011
Publication title -
wuli huaxue xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.396
H-Index - 37
ISSN - 1000-6818
DOI - 10.3866/pku.whxb20110802
Subject(s) - formaldehyde , radical , dielectric barrier discharge , dielectric , photochemistry , materials science , chemistry , organic chemistry , optoelectronics