Open AccessInfluence of Deposition Temperature on the SiN<sub><em>x</em></sub>:H Film Prepared by Plasma Enhanced Chemical Vapor Deposition
Author(s) -
Zheng Wen,
Xia Cao,
Chen Zhou,
Lei Zhao,
Hailing Li,
Wenjing Wang
Publication year - 2011
Publication title -
wuli huaxue xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.396
H-Index - 37
ISSN - 1000-6818
DOI - 10.3866/pku.whxb20110632
Subject(s) - deposition (geology) , chemical vapor deposition , plasma , materials science , analytical chemistry (journal) , plasma enhanced chemical vapor deposition , chemistry , nanotechnology , environmental chemistry , physics , biology , paleontology , quantum mechanics , sediment