Open AccessA Model of Stoichiometric Displacement for the Adsorption of Benzoic Acid and Benzene by Silica Gel from Cyclohexane Solution
Author(s) -
Yuyin Chen,
Louzhen Fan,
Yongchun Liu
Publication year - 2005
Publication title -
wuli huaxue xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.396
H-Index - 37
ISSN - 1000-6818
DOI - 10.3866/pku.whxb20051104
Subject(s) - cyclohexane , benzene , benzoic acid , stoichiometry , adsorption , displacement (psychology) , silica gel , materials science , chemistry , organic chemistry , psychology , psychotherapist