Open AccessAdsorption Dynamics of Oxygen Atom and Hydroxyl Radical on Low Index Nickel Surfaces
Author(s) -
Zexin Wang,
济南 山东师范大学化学系,
Shougang Chen,
Qingan Qiao,
Wenxia Zhang
Publication year - 2001
Publication title -
wuli huaxue xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.396
H-Index - 37
ISSN - 1000-6818
DOI - 10.3866/pku.whxb20011110
Subject(s) - nickel , adsorption , chemistry , atom (system on chip) , oxygen , oxygen atom , hydroxyl radical , photochemistry , index (typography) , atomic oxygen , radical , organic chemistry , molecule , world wide web , computer science , embedded system