
Selection of synthesis parameters for niobium pentaoxide films by oxidation in phosphoric acid solution.
Author(s) -
M. A. Okunev,
A. R. Dubrovskii,
О. В. Макарова,
S. A. Kuznetsov
Publication year - 2020
Publication title -
trudy kolʹskogo naučnogo centra ran
Language(s) - English
Resource type - Journals
ISSN - 2307-5252
DOI - 10.37614/2307-5252.2020.3.4.030
Subject(s) - niobium pentoxide , niobium , phosphoric acid , anodic oxidation , anode , materials science , phosphorus pentoxide , oxidation process , selection (genetic algorithm) , process (computing) , inorganic chemistry , chemical engineering , chemistry , metallurgy , electrode , organic chemistry , computer science , engineering , operating system , artificial intelligence
The possibilities of synthesis of niobium pentoxide films by anodic oxidation were studied. The process parameters leading to the formation of coherent dense films were determined. Itwas shown that films with the thickness of 30 up to 400 nm can be obtained during the first 15 minutes of the process by varying the voltage.