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Influence of Electron Beam Irradiation on the Electrical and Optical Properties of InGaZnO Thin Film Transistor
Author(s) -
In-Hwan Cho,
Hai-Woong Park,
Chan-Joong Kim,
ByungHyuk Jun
Publication year - 2017
Publication title -
korean journal of materials research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2017.27.6.345
Subject(s) - materials science , irradiation , x ray photoelectron spectroscopy , electron , threshold voltage , semiconductor , band gap , electron beam processing , ellipsometry , optoelectronics , fermi level , thin film transistor , analytical chemistry (journal) , cathode ray , transistor , thin film , voltage , nuclear magnetic resonance , nanotechnology , chemistry , electrical engineering , physics , quantum mechanics , layer (electronics) , nuclear physics , engineering , chromatography

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