Open AccessGap-Fill Characteristics and Film Properties of DMDMOS Fabricated by an F-CVD System
Author(s) -
Woojin Lee,
Atsuki Fukazawa,
YongHo Choa
Publication year - 2016
Publication title -
korean journal of materials research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2016.26.9.455
Subject(s) - materials science , chemical vapor deposition , microelectronics , micrometer , trench , deposition (geology) , optoelectronics , nanotechnology , engineering physics , composite material , optics , layer (electronics) , engineering , paleontology , physics , sediment , biology
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