Open AccessAtomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules
Author(s) -
Byeonghyeon Jang,
SooHyun Kim
Publication year - 2016
Publication title -
korean journal of materials research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2016.26.8.430
Subject(s) - atomic layer deposition , materials science , x ray photoelectron spectroscopy , amorphous solid , thin film , analytical chemistry (journal) , dielectric , annealing (glass) , chemical vapor deposition , nanotechnology , chemical engineering , crystallography , chemistry , optoelectronics , composite material , organic chemistry , engineering
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