Open AccessComparison on the Physical & Chemical Characteristics in Surface of Polished Wafer and Epi-Layer Wafer
Author(s) -
Jin-Seo Kim,
Hyungtak Seo
Publication year - 2014
Publication title -
han'gug jaeryo haghoeji/han-guk jaeryo hakoeji
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2014.24.12.682
Subject(s) - wafer , materials science , surface roughness , layer (electronics) , hydrofluoric acid , isotropic etching , etching (microfabrication) , epitaxy , x ray photoelectron spectroscopy , surface finish , chemical state , analytical chemistry (journal) , chemical composition , optoelectronics , chemical engineering , composite material , metallurgy , chemistry , chromatography , organic chemistry , engineering