Open AccessO2/N2 Plasma Etching of Acrylic in a Multi-layers Electrode RIE System
Author(s) -
Jaekwon Kim,
Ju-Hyeong Kim,
Yeon-Hyun Park,
Young-Woo Joo,
I. K. Baek,
Guan-Sik Cho,
Hanjung Song,
Jewon Lee
Publication year - 2007
Publication title -
han'gug jaeryo haghoeji/han-guk jaeryo hakoeji
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2007.17.12.642
Subject(s) - materials science , etching (microfabrication) , electrode , plasma , reactive ion etching , plasma etching , composite material , chemical engineering , layer (electronics) , chemistry , nuclear physics , physics , engineering