Comparison of nitrogen and oxygen annealing effects on the structural, optical and electrical properties of ALD-ZnO thin films
Author(s) -
연규 박,
종무 이,
안나 박
Publication year - 2005
Publication title -
korean journal of materials research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2005.15.8.514
Subject(s) - materials science , annealing (glass) , nitrogen , oxygen , thin film , metallurgy , chemical engineering , optoelectronics , nanotechnology , chemistry , organic chemistry , engineering
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