Crystallographic and Interfacial Characterization of Al2O3 and ZrO2 Dielectric Films Prepared by Atomic Layer Chemical Vapor Deposition on the Si Substrate | Zendy

중정 김 | Zendy; 준모 양 | Zendy; 관용 임 | Zendy; 흥재 조 | Zendy; 주철 박 | Zendy; 순영 이 | Zendy; 정선 김 | Zendy; 근홍 김 | Zendy; 대규 박 | Zendy

Open Access

Crystallographic and Interfacial Characterization of Al2O3 and ZrO2 Dielectric Films Prepared by Atomic Layer Chemical Vapor Deposition on the Si Substrate

Author(s) -

중정 김,

준모 양,

관용 임,

흥재 조,

주철 박,

순영 이,

정선 김,

근홍 김,

대규 박

Publication year - 2003

Publication title -

korean journal of materials research

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.153

H-Index - 10

eISSN - 2287-7258

pISSN - 1225-0562

DOI - 10.3740/mrsk.2003.13.8.497

Subject(s) - materials science , atomic layer deposition , chemical vapor deposition , layer (electronics) , characterization (materials science) , substrate (aquarium) , chemical engineering , dielectric , deposition (geology) , combustion chemical vapor deposition , thin film , nanotechnology , optoelectronics , carbon film , oceanography , sediment , engineering , biology , geology , paleontology

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