Open AccessCrystallographic and Interfacial Characterization of Al2O3 and ZrO2 Dielectric Films Prepared by Atomic Layer Chemical Vapor Deposition on the Si Substrate
Author(s) -
Joong-Jung Kim,
JunMo Yang,
Kwan-Yong Lim,
Heung-Jae Cho,
Won Kim,
Ju-Chul Park,
Soun-Young Lee,
Ji Soo Kim,
Geun-Hong Kim,
Dae-Gyu Park
Publication year - 2003
Publication title -
han'gug jaeryo haghoeji/han-guk jaeryo hakoeji
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2003.13.8.497
Subject(s) - materials science , atomic layer deposition , chemical vapor deposition , layer (electronics) , characterization (materials science) , substrate (aquarium) , chemical engineering , dielectric , deposition (geology) , combustion chemical vapor deposition , thin film , nanotechnology , optoelectronics , carbon film , oceanography , sediment , engineering , biology , geology , paleontology