Characteristics of Surface Reaction of SnO2 Thin Films Prepared by MOCVD | Zendy

경희 박 | Zendy; 용진 서 | Zendy; 광준 홍 | Zendy; 우선 이 | Zendy; 진성 박 | Zendy

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Characteristics of Surface Reaction of SnO2 Thin Films Prepared by MOCVD

Author(s) -

경희 박,

용진 서,

광준 홍,

우선 이,

진성 박

Publication year - 2003

Publication title -

korean journal of materials research

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.153

H-Index - 10

eISSN - 2287-7258

pISSN - 1225-0562

DOI - 10.3740/mrsk.2003.13.5.309

Subject(s) - metalorganic vapour phase epitaxy , materials science , tin dioxide , thin film , substrate (aquarium) , chemical vapor deposition , scanning electron microscope , analytical chemistry (journal) , microstructure , deposition (geology) , tin , combustion chemical vapor deposition , oxygen , carbon film , chemical engineering , nanotechnology , composite material , layer (electronics) , metallurgy , epitaxy , chemistry , chromatography , organic chemistry , engineering , paleontology , oceanography , sediment , geology , biology

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