Open AccessCharacteristics of Surface Reaction of SnO2 Thin Films Prepared by MOCVD
Author(s) -
Kyung-Hee Park,
Yong-Jin Seo,
Hong Kim,
Woo-Sun Lee,
Jinseong Park
Publication year - 2003
Publication title -
han'gug jaeryo haghoeji/han-guk jaeryo hakoeji
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2003.13.5.309
Subject(s) - metalorganic vapour phase epitaxy , materials science , tin dioxide , thin film , substrate (aquarium) , chemical vapor deposition , scanning electron microscope , analytical chemistry (journal) , microstructure , deposition (geology) , tin , combustion chemical vapor deposition , oxygen , carbon film , chemical engineering , nanotechnology , composite material , layer (electronics) , metallurgy , epitaxy , chemistry , chromatography , organic chemistry , engineering , paleontology , oceanography , sediment , geology , biology